At higher temperatures, the crystal edge growth rate is faster than the surface growth rate during Ostwald ripening and recrystallization, resulting in the formation of NiO octahedron with a large surface depression skeleton crystal structure. At the lower temperature calcination, small depressions are produced due to the effect of crystal face Ostwald ripening. Generally speaking, in the process of rapid growth with only diffusion mechanism, crystal imperfections such as crystal plane depression and skeleton crystal will be formed. The mechanism of crystal recrystallization at different temperatures during calcination was discussed. The final samples were prepared by calcining the precursor at different temperatures. Initially, nickel nitrate hexahydrate (Ni(NO 3) 2♶H 2O) and anhydrous ethanol mixtures were used as a material. In this work, we were committed to building a nickel oxide (NiO) octahedron with skeleton crystal structure as a capacitor electrode for supercapacitance through a template-free and efficient one-step process.
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